Rectangle Magnetron Sputtering Cathode For PVD Coating Machine
Compact and easy to install design.
High strength rare earth magnet module
Compatibility with DC, pulsed dc operation.
High sputtering rate coupled with excellent target utilization.
Integrated argon gas inlet assembly.
Optimized turbulent water flow to provide uniform target cooling.
Low operating pressures.
Flexibility to accept target in 'clamp on' or 'bonded' configuration to cover broad range of thicknesses down to foils.
External or internal mounting optional.
UBM option available in all categories.
UHV compatible sources are also available
Integrated shutter assembly.
We also provide the customized design for your own application. Welcome to contact us for more details.