Customized Arc Evaporator for Vacuum Deposition
This custom-engineered arc evaporator is purpose-built for high-performance physical vapor deposition (PVD) processes across industrial and research scenarios. It delivers exceptional versatility for depositing hard protective coatings, decorative films, semiconductor functional layers, and fusion-facing component coatings, supporting materials ranging from metals, alloys to ceramics and silicon-based compounds.
The equipment features a precisely controlled cathode spot motion system that ensures stable, continuous arcing on various target materials. It achieves industry-leading high deposition rates while maintaining low energy consumption, with a peak ionization rate reaching 60%–80% to guarantee strong film-substrate adhesion. Its modular design allows full customization of cathode configuration, vacuum system specifications, and process monitoring modules to match unique production or research requirements.
We provide customized PVD arc source. It is also called cathodic arc evaporator. It's the coating system for multi arc ion plating machine. This coating technology is usually used for coating those materials which can stand high temperature, e.g. ceramic, glass, stainless steel, etc.
Applications:
- Deposition of super-hard protective coatings for tools and molds
- Decorative color PVD films for consumer electronics and watches
- Functional wear-resistant coatings for aerospace engine parts
- High-density boron carbide and silicon-based coatings for fusion energy facilities
Advantages:
Customizable target capacity from 10g to 40kg, temperature up to 3000℃
High deposition rate with low energy consumption
60%–80% high ionization rate for superior film adhesion
Compatible with UHV system down to 6×10⁻⁴Pa
Modular design for easy function expansion