1356mhz RF Generator for Vacuum Thin Film Deposition

1356mhz RF Generator for Vacuum Thin Film Deposition

General Description

This power supply is designed for low-power, high-speed applications. This RF power supply is compact, lightweight, and has an air-cooled design. Its high quality components and low part count optimize reliability and product life cycle, maximizing your investment and process productivity. It has an intuitive and quick operation menu that can be switched on the multi-functional front panel of the unit and displayed on a 192 X 64 pixel LCD screen for unparalleled convenience – increasing operator efficiency and minimizing training costs.

Product performance

• It has a simple modular design, perfect production and quality system;
• Its core components are all imported materials, quality assurance; It is a new scheme with high efficiency, which ensures that the product has low calorific value for a long time;
• It has PLC/RS232/485 user interface, pin definition can be customized according to customer design;
• We optimize its design, shield radiation interference, and ensure the safe operation of operators;
• The power supply has a number of protection settings to ensure that the power supply will not be damaged in case of various sudden failures.

Advantage

• Longer process execution times
• Easy and flexible operation
• Quickly realize customer customization
• Easy to use and cost saving
• High efficiency and low heating value

Technical Specifications:

Automatic matchers

The automatic matcher is used for vacuum coating, plasma etching, plasma cleaning, physical vapor deposition, chemical vapor deposition, magnetron sputtering, solar manufacturing equipment PECVD and other equipment, and has the main function of realizing full-automatic matching, thereby solving a technical vacancy in the current domestic vacuum coating equipment; It is automatic, fast, reliable, efficient, accurate, labor-saving and time-saving. The optional RF system detection module detects the system's forward and reverse power, VSWR, RF signal peak voltage, current, and DC bias voltage in real time, allowing you to detect and significantly reduce process variability.

Product performance

• It has a targeted matching network to ensure that the matching range meets the load application.
• Its performance is safe and reliable, and it works stably for a long time.
• It can measure and control the reflected power in real time; We optimize design, installation, use and maintenance.
• It has high transmission efficiency and low operation noise. It has good shielding effect and ensures the safety of operators.
• It can be externally connected with a matching control box and used together with other RF power generators.

Advantages

• It can enhance the control of coating and etching process.
• It can optimize the matching algorithm and speed up the matching time.
• We optimize the design to minimize SWR and reflected power It has strict reliability testing and perfect quality system monitoring.
• It can design a matching impedance network according to the customer's load characteristics to ensure the stable operation of the equipment.
• We improve the production and processing system, can be customized according to customer design.
• It can be externally connected with a matching control box and used together with other RF power generators.