Bipolar Pulsed DC Magnetron Sputtering Plasma Power
1: Its main loop topology adopts PFC+full bridge architecture combined with ARM+DSP digital control technology
2: It has a built-in arc extinguishing time setting of 10μs-100μs to adapt to different processes and targets. Arc display counts
3: Its output frequency 10-120KHZ pulse interval 1-10μs
4: Constant power, constant current, constant voltage to meet any process requirements
5: It can significantly improve the charge accumulation phenomenon on the target surface, reduce the number of firings on the sputtering surface, and improve the quality of the film.
6: Pulse & DC output in two modes to meet different process requirements.
7: The operation can be controlled by the panel. The remote PLC controls the analog PROFIBUS communication.