Multiple Chambers Magnetron Sputtering Coater Metal Thin Film Deposition
Advantages of the inline sputter coater:
High deposition rate: The magnetic field confines electrons and increases the probability of ionization. The deposition rate is 30%-50% higher than that of ordinary sputtering.
Low damage coating: The substrate has low temperature rise and is suitable for heat sensitive materials (such as plastics, polymers).
Excellent film quality: neutral atom deposition, dense film and strong adhesion, suitable for optical and semiconductor fields.
Easy to operate: PLC integrated touch screen control, which can preset vacuum, current, temperature and other parameters to support automatic operation.
Applications
① Research on scientific research experimental materials: Prepare metal thin films (such as Al, Cu), alloy thin films (such as NiCr) and compound thin films (such as TiN, SiO ₂) for 儿material surface modification and catalytic performance testing.
② Semiconductor devices: Deposit conductive films (such as ITO) and barrier layers (such as TiW) to optimize device performance.
③ Optical coating: Prepare anti-reflective films and reflective films to improve the transmittance or reflectivity of optical elements.
④ Small-batch industrial production of electronic components: plating conductive films for capacitors and resistors to improve conductivity.
⑤ Decorative coating: metal film (such as Au, Ag) is deposited on the surface of hardware and watch case to improve the aesthetic appearance