Magnetron Sputtering Installation with Arc Evaporator
This sputtering coater comes with a set of cylindrical magnetron sputtering gun with DC sputtering power source.
It also comes with a set of arc evaporator to do plasma etching for activating the surface of substrates before sputtering coating.
The size of vacuum chamber is made to order.
| Maximum loading size: | We design the vacuum chamber size and loading fixture according to customer requirements |
| Vacuum chamber type: | Vertical |
| Vacuum chamber material: | Stainless steel or carbon steel |
| PVD technology: | DC magnetron sputtering or Mid-frequency sputtering |
| Vacuum pumping ability | 8min can reach 0.05Pa |
| Vacuum system: | Turbo molecular pump or diffusion pump + roots pump + mechanical pump |
| Processing cycle: | It takes less than 15 minutes to complete the process from substrate placement, sputtering, and removal. It also varies according to different processes. |
| Thickness monitor | Optional |
| Sputtering materials: | Aluminum, copper, titanium, stainless steel, silver, etc. According to customer process requirements |
| Process gas: | Argon, nitrogen, oxygen, acetylene, etc |