Compact DC Sputtering System With Planetary Rotation
In the evolving world of thin-film research and development, achieving consistent, high-quality coatings on complex substrates is paramount. Our Compact DC Sputtering System with Planetary Rotation is engineered to meet this exact need. This versatile, space-saving deposition tool combines the reliability of DC magnetron sputtering with the superior uniformity provided by a planetary rotation substrate holder, making it the ideal choice for laboratories, universities, and pilot production lines.
Discover our compact DC sputtering system with planetary rotation. Ideal for R&D, it ensures exceptional film uniformity on complex substrates. Learn about its features, benefits, and applications.
Technology: Precision Meets Uniformity
This system is built around two key technological pillars:
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DC Magnetron Sputtering: A proven and efficient physical vapor deposition (PVD) technique. It enables the deposition of a wide range of conductive materials (like Au, Ag, Pt, Cr, ITO) onto various substrates with excellent adhesion and film purity.
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Planetary Rotation Mechanism: This is the system's standout feature. The substrate holder performs a complex, multi-axis "planetary" motion—where substrates rotate on their own axis while simultaneously revolving around a central point. This eliminates the "line-of-sight" limitations of standard sputtering, ensuring every surface of complex, 3D, or multiple small substrates receives an identical flux of coating material.
Features
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Unmatched Film Uniformity: The planetary rotation system guarantees thickness uniformity better than ±3% across the substrate batch, even for materials with non-uniform erosion targets. This is critical for reproducible R&D results and reliable small-batch production.
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Compact & Modular Design: Optimized for lab environments where space is at a premium. Its modular architecture allows for future upgrades, such as adding RF capability for dielectric materials or additional sputtering sources.
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Enhanced Coating Efficiency: Maximizes target material usage and coats multiple substrates or complex parts in a single run, improving throughput and reducing cost-per-sample.
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Versatile Substrate Compatibility: Handles a diverse array of substrates including silicon wafers, glass slides, ceramics, polymers, and even small mechanical parts.
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User-Friendly Operation: Features an intuitive touchscreen interface for process control, recipe management, and system monitoring. Safety interlocks and automated pump-down sequences ensure safe and repeatable operation.
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Robust Vacuum System: Equipped with a high-performance turbomolecular pump and backing pump to achieve a base pressure in the 10⁻⁶ mbar range, essential for creating clean, uncontaminated thin films.
Applications
This system is perfectly suited for applications demanding precise and uniform thin films:
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Advanced Materials Research: Developing novel coatings for optics, electronics, and energy applications.
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Microelectronics & Semiconductors: Depositing conductive layers for devices, sensors, and MEMS.
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Optical Coatings: Creating anti-reflective, reflective, or filter coatings on lenses and components.
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Wear & Corrosion Resistance: Applying protective metal or ceramic-like coatings on tools and components.
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Life Sciences: Coating bio-compatible layers on implants or creating substrates for biosensors.
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Pilot Production & Prototyping: Scaling up novel coating processes from concept to low-volume manufacturing.
Why Choose Our System?
Our Compact DC Sputtering System with Planetary Rotation offers a unique value proposition: it delivers the film quality and uniformity of larger industrial systems in a benchtop-friendly format. It bridges the gap between basic research and pre-commercialization, providing the data and samples needed to advance your projects with confidence.
Ideal for: Research Scientists, PhD Students, Process Development Engineers, and Innovative Startups.
Optimize your thin-film research. Request a detailed quote or schedule a virtual demo today to see how our compact, planetary rotation sputtering system can advance your next breakthrough.