Cathodic Arc Evaporator PVD Cathodic Arc Source
Multi-arc cathode is the core component of multi-arc ion plating technology. It is an electrode that generates and emits metal plasma through vacuum arc discharge.
Advantages:
High ionization rate: In the produced plasma, the proportion of metal ions is very high (up to 60%-90%), which is much higher than other PVD technologies such as magnetron sputtering.
Fast deposition rate: Fast film formation rate due to high evaporation and ionization efficiency.
Good film quality: High-energy ion bombardment makes the film dense, the internal stress is controllable, and the bonding force with the substrate is very strong.
Simple process: The equipment structure is relatively simple and easy to operate.
A wide range of plating materials: as long as it can be made into conductive solid-state targets, almost all metals and alloys can be coated with it.
(Arc Cathode During PVD Coating)
Main Applications:
Cathodic arc cathode technology is the core of multi-arc ion plating and is widely used in:
Tool coating: TiN, TiAlN, CrN and other super-hard coatings are plated on tools and molds to greatly improve their wear resistance and service life. This is its most mature and widely used field.
Decorative coating: TiN (gold), ZrN (bright silver), TiCN (rose gold), etc. are plated on watches, jewelry and sanitary ware to provide a beautiful and wear-resistant surface.
Functional thin films: used in the fields of semiconductors and microelectronics to prepare metal conductive layers, diffusion barrier layers, etc.