Bell-Jar Type Laboratory Small-Scale Multi-Arc Ion Deposition System

Precision Coating for Advanced R&D
Unlock the potential of high-performance thin-film coatings with our Bell-Jar Type Laboratory Small-Scale Multi-Arc Ion Deposition System. Designed for research laboratories, university facilities, and small-batch production environments, this compact system delivers industrial-grade arc ion deposition technology in a benchtop-friendly, easy-to-operate package.

Why Choose Our Multi-Arc Ion Deposition System?

Multi-arc ion deposition is widely recognized for producing dense, adherent, and high-quality coatings such as TiN, CrN, AlTiN, DLC (diamond-like carbon), and other metal or compound films. Our bell‑jar system brings these capabilities to the lab scale, offering:

  • Superior Film Adhesion – High ion energy bombards the substrate prior to deposition, enabling atomic-level bonding.

  • Dense, Smooth Coatings – The arc spot rapidly moves across the target surface, minimizing macro‑particles and producing fine‑grained layers.

  • Versatile Material Selection – Compatible with conductive targets, including metals, alloys, and carbon.

  • Compact & Transparent Design – The quartz bell jar allows real‑time process observation, ideal for teaching and process development.

Features


 Space‑Saving Bell‑Jar Chamber
High‑strength quartz or stainless steel bell jar (optional)
Easy access for sample loading and cleaning
Excellent visibility for monitoring plasma and arc spots

 Multi‑Arc Evaporation Sources
1–4 independently controlled arc sources (customizable)
Steady arc current from 40 A to 120 A
Magnetic steering for stable arc motion and reduced droplet emission

 Substrate Bias & Heating
Pulsed or DC bias voltage (0 V to –500 V) to enhance ion bombardment
Substrate heater up to 500 °C for temperature‑dependent coatings

 User‑Friendly Control System
PLC + HMI touchscreen interface
Fully programmable deposition recipes (pressure, arc current, bias, rotation speed, duration)
Real‑time data logging and alarm monitoring

 Planetary Sample Holder
Multiple substrate positions (e.g., 2–6 inches up to 8 samples)
Continuous rotation for uniform film thickness

 Reliable Vacuum System
Base pressure: ≤ 5×10⁻⁴ Pa (turbo + rotary vane or dry pump)
Fast pump‑down time (< 15 min to process pressure)
Automatic leak detection and venting

Technical Specifications

Parameter Value
Chamber type Stainless steel bell jar (Ø300 mm × 350 mm typical)
Number of arc sources Up to 4 (single or multi‑target)
Arc current 200 A (per source)
Bias voltage DC or pulsed, 0 V to –1000 V
Substrate heating Ambient to 500 °C (±5 °C)
Substrate holder Planetary rotation, speed 5–40 rpm
Base pressure ≤ 5×10⁻⁴ Pa
Working pressure 0.1–5 Pa (Ar or reactive gas)
Typical deposition rate 0.1–1 µm/min (depending on material)
Cooling Integrated water‑cooling for arc sources and chamber
Power supply 380 V / 220 V, 50/60 Hz, 8 kW (max)
Dimensions (approx.) 800 mm (W) × 800 mm (D) × 1200 mm (H)

Applications

  • Academic research – Study of nitride, carbide, and carbon‑based films

  • Materials engineering – Wear‑resistant, corrosion‑resistant, or decorative coatings

  • Semiconductor & MEMS – Barrier layers, protective coatings

  • Medical device prototyping – Biocompatible coatings (e.g., TiN on surgical tools)

  • Aerospace & automotive – Friction reduction and surface hardening

  • Cutting tools & molds – Production of small batches of coated inserts

What’s Included?

  • Bell‑jar vacuum chamber with viewport

  • Multi‑arc source assembly (standard: 2 sources)

  • Substrate bias power supply & heating stage

  • Rotary vane pump + turbo molecular pump (or optional)

  • PLC control cabinet with touch panel

  • Planetary sample holder with cooling

  • Installation tool kit & operation manual

  • 12‑month warranty + remote technical support

Custom configurations available upon request – up to 4 arc sources, larger chamber size, reactive gas control (N₂, C₂H₂, O₂), and deposition‑rate monitoring.

Contact us today for a tailored solution that fits your budget and application requirements.