Rotatable Cylindrical Magnetron Sputtering Cathode For DC & Medium Frequency (MF) Sputtering

Engineered for high-rate deposition, excellent target utilization, and long-term stability

With nearly 20 years of expertise in vacuum coating and advanced PVD components, we proudly present our Cylindrical Rotatable Magnetron Cathode – designed for both DC and Medium Frequency (MF, ~40 kHz) sputtering processes. Whether you need uniform large-area coatings or reactive sputtering, this cathode delivers superior performance, durability, and cost efficiency.

Why Choose a Cylindrical Magnetron Cathode?

Unlike planar cathodes, cylindrical (rotatable) designs offer:

  • Up to 80% target utilization – dramatically lower material cost

  • Continuous stable discharge – no racetrack erosion groove

  • Higher power density – increased deposition rate

  • Ideal for reactive processes (DC/MF sputtering of oxides, nitrides, carbides)

  • Reduced arcing – smoother operation with MF power supply

Our cathode works seamlessly with both DC generators (conductive targets) and MF (mid-frequency) AC generators (reactive or insulating target sputtering).

Features

Feature Benefit
Dual compatibility Supports DC / MF (40 kHz) operation without modification
Robust rotary feedthrough Smooth rotation for even target erosion
Integrated magnetic assembly Optimized closed magnetic field for high plasma density
Efficient water cooling Direct cooling of target surface – enables high power loads (up to 20 kW/m depending on target material)
Compact & modular design Easy integration into inline, roll-to-roll, or batch coaters
Vacuum compatible materials Stainless steel, high-purity aluminum, PEEK insulators – low outgassing, compatible with HV/UHV
Easy maintenance Quick target replacement, end-block design with bearing access

Applications

  • Large-area glass coating (Low-E, solar control, anti-reflective)

  • Web/roll-to-roll coating (flexible electronics, packaging films)

  • Decorative & functional coatings (TiN, CrN, ZrN, DLC, Al₂O₃, SiO₂)

  • Reactive sputtering of dielectrics using MF power

  • Semiconductor & optical coating (with clean design options)

Compatibility & Integration

Our cylindrical cathode can be retrofitted into most standard vacuum systems. We provide:

  • Complete end-block assemblies (rotary & fixed sides)

  • Magnetic bar sets (standard or customized field profile)

  • Target tube bonding/clamping solutions

  • Feedthroughs & connection kits

We also offer turnkey installation support and on-site commissioning.

Technical Specifications

Parameter Value
Power supply type DC or MF (40–80 kHz, bipolar)
Cathode length Custom: 300 mm – 3000 mm+
Target diameter Common options: Φ57 mm, Φ73 mm, Φ82 mm, Φ100 mm (customizable)
Max. DC power Up to 30 kW per cathode (depending on cooling and length)
Max. MF power Up to 40 kW
Cooling water requirement ≥ 15 L/min, < 30°C, pressure drop ≤ 2 bar
Operating vacuum range 0.1 – 1 Pa (10⁻³ – 10⁻² mbar)
Material SS304 / SS316, high-conductivity copper components
Flanges ISO-K / CF / custom

All specifications can be customized for your coating system.