PVD Hybrid Coating System integrates Multi-Arc Ion Plating and Mid-Frequency (MF) Magnetron Sputtering technologies into a single high-vacuum deposition platform. Designed for surface engineering, decorative finishing, and functional hard coatings, this dual-process PVD machine delivers superior adhesion, dense microstructure, and uniform film thickness across complex 3D geometries.

Ideal for industries such as aerospace, automotive, medical devices, tooling, and luxury goods, this hybrid system enables both metal and compound coatings including TiN, CrN, AlTiN, DLC, and Zr-based films — all within one chamber without breaking vacuum.

Technical Specifications

Parameter Details
Chamber Size Ø850 × H900 mm (customizable)
Coating Technology Multi-Arc Ion Plating + MF Magnetron Sputtering
Power Supply 40 kW Pulsed DC for Arc; 20 kW MF for Sputtering
Target Configuration 6 Arc cathodes + 1 or 2 MF magnetron cathodes
Substrate Bias Pulsed DC bias: 0–1000V, 50–250 kHz
Max Substrate Size Ø150 × H400 mm (batch loading available)
Coating Uniformity ±5% across all fixture positions
Cycle Time 60–180 min depending on coating type
Vacuum System Rotary vane + Roots + diffusion pump (oil-free option available)
Base Pressure ≤ 5.0 × 10⁻³ Pa
Control System PLC + HMI touchscreen, recipe-based auto sequencing

Hybrid Technology Advantages

 * Multi-Arc Ion Plating (Arc Ion Plating)

  • High ionization rate (>80%) for excellent adhesion and film compactness

  • Ideal for wear-resistant coatings like TiAlN, AlCrN, and CrN

  • Efficient target utilization and rapid deposition

 * MF Magnetron Sputtering (Mid-Frequency Sputtering)

  • Smooth, droplet-free surfaces — ideal for decorative and optical coatings

  • Precise control over composition for alloy and compound films

  • Eliminates anode disappearing effect; stable reactive sputtering

 * Hybrid Operation Modes

  • Independent Mode: Arc or sputtering only

  • Synchronous Mode: Co-deposition for nano-multilayer structures

  • Sequential Mode: Arc interlayer + sputtering topcoat

System Components

  1. Vacuum Chamber – Double-wall stainless steel, water-cooled

  2. Arc Power Supply – Pulsed arc source with arc suppression

  3. MF Sputtering Source – Dual-target configuration, closed-field design

  4. Substrate Rotation – Planetary or 3-axis rotation for 360° coating

  5. Gas Control – MFC-controlled Ar, N₂, C₂H₂, O₂

  6. Heating System – Radiant heating up to 450°C

  7. Ion Source – Optional linear anode-layer ion source for pre-cleaning

Why Choose Hongfeng VAC?

✅ 18+ years of PVD system integration experience
✅ Customized chamber sizes and cathode layouts
✅ Remote diagnostics and global technical support
✅ CE-certified electrical and vacuum components
✅ On-site training and process development assistance