HiPIMS Power Supply – High Power Impulse Magnetron Sputtering Power Supply

Take your thin‑film deposition process to the next level with our advanced HiPIMS Power Supply. Engineered for high‑performance magnetron sputtering, it delivers industry‑leading power density, unmatched waveform flexibility, and revolutionary arc suppression. Whether you are developing optical coatings, hard coatings, or functional films, this power supply gives you the precision, reliability, and efficiency you need – all in one compact unit.

 Advantages

1. Global Leading Constant‑Power Output – 3x the Load Capacity

Our proprietary constant‑power characteristic offers a wide voltage‑current selection range. In the optimal operating zone, it drives up to 4 single magnetrons or 4 twin magnetrons –

• 3× the load capacity of domestic competitors at the same power rating

• 1.5× the load capacity of international counterparts

Result: One power supply does the work of several, slashing equipment cost and system complexity.

2. Widest Impedance Matching Range (1:13) – Unmatched Process Stability

• Our HiPIMS supply: 1:13

• Overseas products: 1:3

• Domestic alternatives: 1:1

A high impedance ratio means the power supply automatically stays in the optimal working zone even as target impedance changes (e.g., target poisoning or erosion). You get consistent, repeatable deposition run after run.

3. Dozens of Pulse Waveforms – One Power Supply for All Your Processes

Choose from tens of pulse waveforms covering all modern coating requirements (see waveform table). Unlike single‑waveform units, our power supply adapts to pre‑ionization, multi‑pulse, bipolar, and other advanced modes.
Benefit: Higher film quality, faster deposition rate, and maximum flexibility for process development.

4. Industry‑Best Efficiency (96.3%) – Lower Energy Cost

Peak efficiency up to 96.3% – 10‑15% higher than comparable products. Lower heat dissipation, lower electricity bills, and a greener footprint.

5. Unrivalled Reliability – MTBF > 100,000 hours

The only domestic product with Mean Time Between Failures exceeding 100,000 hours (>11 years). Minimize downtime and maintenance costs.

6. Breakthrough Arc Suppression – <0.2 mJ/kW Arc Energy

• Differential arc detection – senses the arc before it fully develops

• Intrinsic arc suppression – prevents formation of barrier layers on the workpiece

• Four‑quadrant arc energy management – limits arc energy to <0.2 mJ/kW (lowest in its class)

Result: No arc damage to your delicate coatings – perfect for high‑value optical and functional films.

7. Full EMC Compliance – EN55022 & IEC61000

The only domestic HiPIMS supply that fully meets international electromagnetic compatibility standards – no interference with sensitive on‑site electronics (sensors, PLCs).

8. Active Three‑Phase PFC – Power Factor > 0.99

Active power factor correction delivers >0.99 power factor and <5% THD (50‑100% load). No reactive power penalty, no grid pollution.

Technical Specifications
Input

Parameter	Value
Voltage	265 VAC – 475 VAC, 3‑phase + PE + N
Frequency	45 Hz – 66 Hz
THD	<5% (50%‑100% load)
Power Factor	>0.99

 

Output

Arc Suppression

Parameter	Value
Detection method	Proprietary differential detection
Arc energy	<0.2 mJ/kW
Features	Dynamic arc energy tracking, programmable arc parameters

General

Parameter	Value
Efficiency	Peak ≈96.3%
Cooling	Air + water hybrid
Communication	RS‑485, Ethernet (Modbus standard; Profibus / EtherCAT optional)
Protections	Overvoltage, overcurrent, overload, device failure, overtemperature, load overheat, interlock, door switch
MTBF	>100,000 hours
EMC	EN55022, IEC61000

Environmental

Parameter	Value
Operating temperature	-20 °C to +60 °C (derated above 55 °C)
Relative humidity	≤90% (non‑condensing)
Atmospheric pressure	70 kPa – 106 kPa

 

Applications

• Optical coatings (AR, HR, bandpass filters)

• Hard & wear‑resistant coatings (TiN, CrN, DLC, AlCrN)

• Functional films (ITO, ZnO, AZO for displays and solar)

• Decorative coatings

• Low‑temperature & substrate‑sensitive deposition

Why Choose Our HiPIMS Power Supply?

✅ More targets per power supply – lower capital cost
✅ Widest impedance matching – stable process even with drifting impedance
✅ Dozens of waveforms – one unit for R&D and production
✅ Highest efficiency & reliability – lower OPEX, longer uptime
✅ Ultra‑low arc energy – flawless coatings, no pinholes or nodules
✅ Global EMC compliance – safe for your entire production line

Contact us today to request a waveform table, or a customized solution for your HiPIMS system.