Cylindrical Magnetron Sputtering Cathodes for PVD coating machine
Easy to install design.
High strength rare earth magnet module
Compatibility with DC, pulsed DC, MF operation.
High sputtering rate coupled with excellent target utilization
The sputtering material can be different metals, and silcon
Integrated argon gas inlet assembly.
Optimized turbulent water flow to provide uniform target cooling.
Low operating pressures.
Flexibility to accept target in 'clamp on' or 'bonded' configuration to cover broad range of thicknesses down to foils.
External or internal mounting optional.
UBM option available in all categories.
UHV compatible sources are also available
Integrated shutter assembly.