Vacuum Magnetron Sputtering Coating Machine
Physical vapor deposition (PVD) is a technology where a material is evaporated and condensed to form a thin film coating over an object (substrate). With a wide range of coating materials and thicknesses, PVD can be customized to applications and the coatings can be optimized for various characteristics, such as decorative, optical, electrical, and mechanical properties.
Magnetron sputtering is one of PVD technique, where ionized particle bombard target surface, when energy is high enough, the target atom will be sputtered out. Magnetron sputtering has following advantages:
PVD is used for depositing decorative films on watch casings, jewelry and furniture, as well as for functional films for moulds and dies, cutting tools, and low-friction machine parts. The process delivers a high pass rate and good quality.
♥ No environmentally damaging materials and emissions, no toxic reaction products
♥ Great variety of coatings can be produced, most substrate can be coated
♥ High wear resistance, Low friction coefficient
♥ Coating temperature below the final heat treatment temperature of most steels
♥ Small, precisely reproducible coating thickness (accurate surface replication, true to size)
High quality sputtering coating unit
Easy operation and maintenance
Coatings on plastics, glass, metal etc
PVD(physical vapor deposition) Magnetron sputtering machine
(The configurations are custom made to meet each customer's needs)
(could be changed according to each machine)
Metal film coatings: Titanium, Chrome, Stainless steel, Aluminum, Silver, Copper, Nikel, atc
Alloy film coatings: TiN, SiO2, TiO, etc
|Decorative applications||Functional applications|
1. Plastic tablewares with food grade silvering coatings
2. Mirror making
3. High quality plastic metallizing;
4. Car parts coating
5. Cosmetic caps coating
Thin film coating onto other items.
1. ITO conductive glass coatings,
2. Low-E glass and sun reflecting glass coatings;
3. Tools coating;
4. Solar heating collecting thin film coating;
|Dimension of vacuum chamber(diameter*height)||600*700mm||900*1000||1000*1100||1200*1400||1400*1600||1800*2000||Continuous line|
|Material of vacuum chamber||Carbon steel, SUS304 or SUS316L|
|Quantity of sputtering cathodes||
DC sputtering cathodes(cylindrical / planar)
MF(Medium frequency) sputtering cathodes (cylindrical / planar)
Quantity of sputtering cathode is open.
|Pumping system||molecular pump or diffusion pump+mechanical pump||molecular pump or diffusion pump+mechanical pumps, booster pump|
|Pumping Time||From atmosphere to 5.0*10-2Pa less than 8 minutes|
|Gas distribution System with Mass Flow Controllers||≥2 sets|
|Vacuum Limit||5.0*10-4 Pa|
As requested( for for continuous model)
Industrial full touched PLC screen
No programming knowledge is required for process control
|Footprint||2*2 meters||2*3 meters||3*3 meters||3*3 meters||3*4 meters||4*5 meters||Depends on needs|
|These units you can custom made||
1. Size of vacuum chamber
2. Quantity of sputtering cathodes
3. Configurations of pumps
4. Gas distribution system
1. Coatings thickness monitor
2. Leakage detector
3. Arc ion deposition system(not for continuous model)
4. Evaporation system(not for continuous model)
Food grade coatings on disposable cutleries
Car headlamps and reflectors
Decorative coatings on steel parts
Other plastic parts
Necessary pretreatment machines:
Base varnish and topcoat applying unit, Drying oven for plastic substrates
Washing and dry machines for glass substrates
Ultrasonic washing machine, pure water machine, drying oven, chiller for metal substrates
We are custom manufacturer of high quality PVD vacuum coating machines. We also provide technical troubleshooting service and modification solutions for old machines.
♥ Ar gas which is activated in plasma forms Ar ions.
♥ The Ar ions sputter out metal atoms from the target.
♥ Magnetic field introduces the Ar ions around the substrate.
♥ Apply negative voltage on the substrate to attract Ar ions that induce active energy to the metal atoms depositing on the substrate.
♥ Solid metal films are formed on the substrate
For more details please inquiry us.
Corresponding parameter set not found, please add it in property template of background
Continuously Magnetron Sputtering Line:
Continuously Magnetron Sputtering Line: