Bipolar Pulsed Bias Power Supply for Precision Coating & Surface Engineering

This unit is a high‑performance bipolar pulsed bias power supply specifically developed for demanding PVD, CVD, plasma nitriding, and hybrid coating processes. It excels in substrate cleaning (glow discharge), ion bombardment prior to deposition, ion acceleration during film growth, and direct nitriding of workpieces. By combining a rugged PFC+SiC full‑bridge topology with DSP+FPGA digital control, this power supply delivers exceptional arc management, precise voltage regulation, and flexible waveform shaping – all essential for producing high‑quality, defect‑free thin films.

Benefits & Differentiators

  • Ultra‑fast arc handling
    Arc detection in <0.1 µs, extinguishing capability up to 20 000 arcs/s, and residual arc energy <0.3 mJ/kW. The patented energy‑removal circuit instantly suppresses arcs, protecting delicate substrates and optical coatings from micro‑damage.

  • Bipolar output with adjustable reverse voltage
    Independent positive and negative bias with up to 15% reverse voltage (negative portion). Mitigates charge accumulation on insulating films, improves layer densification, and enhances adhesion – ideal for reactive sputtering, HiPIMS, and DLC coatings.

  • Two operating modes in one unit

    • Low‑voltage / high‑current mode: 300V / 60A (max)

    • High‑voltage / lower‑current mode: 1000V / 15A (max)
      Seamlessly switchable without hardware change – covers both high‑current plasma cleaning and high‑voltage ion acceleration.

  • Precise digital control
    Output frequency: 15 – 100 kHz (1 kHz step)
    Pulse duty cycle (off‑time): 0 – 10 µs for true DC to pulsed operation.
    Constant voltage regulation with 1V step resolution, accuracy ≤1% of setpoint.

  • Rich monitoring & communication
    3.1″ OLED display shows real‑time voltage, current, power, and arc counts. Standard analog (0‑10V) and Modbus RTU (RS‑485) interfaces; optional Profibus DP for seamless integration into automated production lines.

Techanical Specifications:

Parameter 10kW Unit 18kW Unit
Input 3×380 Vac ±10%, 50‑60 Hz + PE Same
Output voltage (max) 300V / 1000V (stepless switching) Same
Output current (max) 60A @300V / 15A @1000V (at max duty cycle) Same
Reverse voltage Up to 15% of positive set value (bipolar mode) Same
Output frequency 15‑100 kHz (1 kHz step) Same
Off‑time (dead time) 0‑10 µs (DC mode at 0) Same
Arc detection time <0.1 µs Same
Max arc suppression rate 20 000 arcs/s Same
Residual arc energy <0.3 mJ/kW Same
Operating modes DC / Pulsed (square wave) Same
Display 3.1″ OLED, 1V/0.1A/0.1kW resolution Same
Setting accuracy ≤1% of setpoint Same
Cooling Water‑cooled, ≥8 L/min Same
Dimensions (H×W×D) 5U 19″: 211×480×660 mm Same
Net weight ~50 kg Same
Ambient temperature +5 °C to +45 °C Same

Applications

  • Plasma cleaning (glow discharge) before deposition

  • Ion nitriding / plasma nitriding of tools and mechanical parts

  • Arc evaporation & magnetron sputtering (e.g., TiN, CrN, AlTiN)

  • PECVD & hybrid PVD‑CVD for DLC and functional coatings

  • Ion acceleration during film growth to improve density and adhesion

  • Bias sputtering on insulating or heat‑sensitive substrates